India, US Sign Pax Silica Tech Pact

India and the United States signed the Pax Silica Declaration at the India AI Impact Summit in New Delhi today. The agreement aims to strengthen cooperation between the two countries in key areas such as critical minerals, semiconductor production, and artificial intelligence (AI).

The declaration is expected to help build a secure and reliable global supply chain for silicon and advanced technologies. It also focuses on creating a strong and safe global technology ecosystem as AI and semiconductor industries continue to grow rapidly.

Union Minister for Electronics and Information Technology Ashwini Vaishnaw, who presided over the signing ceremony, said that India’s goal is to become a global leader in the semiconductor and electronics sectors.

He said that Indian engineers are already designing some of the most advanced two-nanometer chips, which are among the most complex chips in the world. This shows the growing capability of India’s technology sector.

The minister also mentioned that the semiconductor industry will require a workforce of more than 10 lakh skilled professionals, and India is preparing to meet this demand. He added that students from 315 universities and colleges across the country are currently involved in chip design projects.

The Pax Silica Declaration marks an important step in deepening India-US cooperation in advanced technologies and supporting the future growth of the global tech industry.